Editorial Cuvillier

Publicaciones, tesis doctorales, capacitaciónes para acceder a una cátedra de universidad & prospectos.
Su editorial internacional especializado en ciencias y economia

Editorial Cuvillier

De En Es
Magnetoresistance of mesoscopic metallic spin-valve devices

Impresion
EUR 16,00 EUR 15,20

E-Book
EUR 11,20

Magnetoresistance of mesoscopic metallic spin-valve devices (Tienda española)

Alexander van Staa (Autor)

Previo

Indice, Datei (19 KB)
Lectura de prueba, Datei (160 KB)

ISBN-10 (Impresion) 3867279802
ISBN-13 (Impresion) 9783867279802
ISBN-13 (E-Book) 9783736929807
Idioma Inglés
Numero de paginas 76
Edicion 1
Volumen 0
Lugar de publicacion Göttingen
Lugar de la disertacion Hamburg
Fecha de publicacion 29.08.2006
Clasificacion simple Tesis doctoral
Area Física
Descripcion

Spin-polarized transport in all-metal spin-valve devices consisting of two bar-shaped permalloy electrodes and an interconnecting aluminum strip are studied in this thesis. Two different geometries are realized: one has a planar aluminum strip, the other has planar permalloy electrodes. The anisotropic magnetoresistance of the electrodes and the magnetoresistance of the entire device are measured in the same cooling cycles at liquid helium temperatures and above. The mesoscopic spin-valve effect is observed in samples with both layouts. The spin-valve effect can be clearly distinguished from parasitic effects, namely the anisotropic magnetoresistance and the local Hall effect. The magnitude of the spin-valve effect and its temperature dependence show good agreement with a theoretical estimation based on diffusive transport. The micromagnetic behavior of the permalloy electrodes is explored with a magnetic-force microscope at room temperature and with measurements of the anisotropic magnetoresistance at low temperatures. Tunnel barriers at the interfaces between the ferromagnets and the normal metal are predicted to increase the spin-injection efficiency. Therefore, the natural oxidation of aluminum in pure oxygen is studied with non-magnetic tunnel junctions. Aluminum oxide tunnel barriers are fabricated successfully both in an evaporation chamber and in a multi-target sputter-deposition system. The latter enables the in situ fabrication of high quality interfaces with aluminum oxide tunnel barriers.